Substrate Heating

           




Ultrahigh Vacuum Infrared Guide Heating System

GVH198, GVH298 (patented)

Clean heating of sample "in ultrahigh vacuum"

Infrared radiation emitted from a heating source on the atmosphere side is introduced into an ultrahigh vacuum to enable clean heating of a sample installed there up to the optional temperature without heating peripheral areas of the sample.
The GVH is used for clean heating of a sample within an X-ray photoelectron spectrometer, within an electron microscope as well as under synchrotron radiation.

Heating area: 10 to 20mm dia.


Ultrahigh-Speed Infrared Guide Heating SystemGV198, GVL298 (patented)

"Ultrahigh-speed heating" of sample in high vacuum

Infrared radiation emitted from a heating source on the atmosphere side is introduced into a high vacuum for high-speed heating of a sample in the high vacuum without heating peripheral areas of the sample.
This system is used for ultrahigh-speed heating of silicon, etc. and also for high-speed heating of thin films and superconductive materials.




Infrared Guide Heating System -Rapid Annealing-GV-1, GV-2 (patented)

Ultrahigh-speed heating of sample in a vacuum

This system comprises an infrared heating system, a vacuum chamber, a high-vacuum exhaust system and a temperature controller. This configuration enables ultrahigh-speed heating and temperature fall control as well as clean heating in a vacuum and in different gas atmospheres along with accurate temperature measurement.

Ultrahigh-speed heating of silicon, thin film, superconductive materials, etc.

 

 




Underside Infrared Guide Heating SystemGVB198, GVB298

Bottom surface heating of sample in a vacuum

Clean heating can be made for a sample alone installed within a compact vacuum chamber. This model is designed to irradiate the sample from its bottom side with an infrared heating unit.
The GVB is used for temperature rise desorption analysis and for heating of a sample being irradiated with X-rays in a vacuum or gas atmosphere.

 

 


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