Ion Sources

Gridded dc ion sources




 

 

Proven linear gridded DC Ion Sources for highly uniform, reliable ion beam deposition process platforms utilizing large/wide individual substrates or large substrate batches.

 

 




 

SOLUS DC Ion Source Controllers

Get stable power for ion source operation with Veeco's SOLUS™ DC Ion Source Controller, featuring a state-of-the-art precision control system design.

 

 

 




 

A proven linear source for large/wide substrates or large substrate batches, Veeco's gridded DC Ion Sources are ideal for highly uniform, reliable ion beam deposition process platforms.

 

 

 


 



 

 

Mark II+ Gridless High Output

For applications requiring high-current, low-energy ions, the Mark II+ Gridless High Output Ion Source is designed for vacuum coating processes in chambers from 70-130cm in diameter.

 

 

 




 

Mark I+ Gridless Ion Source

Improve process uniformity and prevent substrate damage with Veeco's Mark I+ gridless ion source. It provides a high beam current designed for vacuum coating processes.

 

 




 

Mark II+ Controller

Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller.

 

 

 

 




 

Mark II+ Gridless Ion Source

Dramatically increased beam current and a removable anode assembly adds new value to the Mark II+ End-Hall Ion Source.

Veeco's gridded RF ion sources are designed for improved production of long-run ion beam deposition processes.

 

 




 

12cm RF Ion Source

Improve the performance and quality of long uninterrupted reactive processes such as ion beam assist or ion beam deposition of optical coatings, with the Veeco 12cm RF Ion Source.

 

 


 

 



 

16cm High Power RF Ion Source

Ideal for for use in reactive processes, Veeco's 16cm RF HP ion source offers beam uniformity of <10% across 120cm.

 

 

 


 



 

6cm x 22cm RF Ion Source

Designed for highly productive in-line systems with substrates, Veeco's 6 x 22cm gridless linear RF ion source is ideal for processes using 100 percent reactive gases.

 

 

 




 

6cm x 66cm RF Ion Source

Ideal for uniform processing of large-scale substrates, Veeco's 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation for long production runs.

 

 


 



NOVUS RF Ion Source Controller

 

Get stable power for ion source operation with Veeco's NOVUS RF lon Source Controller, featuring a state-of-the-art precision control system design.

 

16cm RF Ion Source

Get a broad uniform ion beam source for reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.